Innovative abatement solutions
Plasma Scrubber can decompose PFCs gases (greenhouse gases) including flammable, corrosive and toxic gases generated from the semiconductor, LCD/OLED manufacturing process equipment by using DC Thermal Plasma.
| Model | Channel | Total Capacity (LPM) | DRE (%) | Combustible Gas | Water Soluble Gas | PFC Gas | Process |
|---|---|---|---|---|---|---|---|
| EPW-600S | Single | 600 | >= 99% | AsH₃, B₂H₆, DCS, GeH₄, H₂, PH₃, SiH₄, Si₂H₆, TEB, TEOS | BCl₃, Cl₂, HF, HCl, HBr, NH₃, WF₆ | CF₄, C₂F₆, C₃F₈, NF₃, SF₆ | ETCH, CVD, METAL, DIFF |
| EPW-1000S | Single | 1000 | >= 99% | AsH₃, B₂H₆, DCS, GeH₄, H₂, PH₃, SiH₄, Si₂H₆, TEB, TEOS | BCl₃, Cl₂, HF, HCl, HBr, NH₃, WF₆ | CF₄, C₂F₆, C₃F₈, NF₃, SF₆ | ETCH, CVD, METAL, DIFF |
| EPW-2000S | Single | 2000 | >= 99% | AsH₃, B₂H₆, DCS, GeH₄, H₂, PH₃, SiH₄, Si₂H₆, TEB, TEOS | BCl₃, Cl₂, HF, HCl, HBr, NH₃, WF₆ | CF₄, C₂F₆, C₃F₈, NF₃, SF₆ | ETCH, CVD, METAL, DIFF |
| EPW-3000S | Single | 3000 | >= 99% | AsH₃, B₂H₆, DCS, GeH₄, H₂, PH₃, SiH₄, Si₂H₆, TEB, TEOS | BCl₃, Cl₂, HF, HCl, HBr, NH₃, WF₆ | CF₄, C₂F₆, C₃F₈, NF₃, SF₆ | ETCH, CVD, METAL, DIFF |